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KPFM: Mean value of Potential depends on the lift distance?

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stsolong posted on Tue, Jul 10 2012 4:11 AM

Hi Friends,

The mean value of Potential shifts 0.5~1 V when the lift distance between the tip and the sample increases or decreases 50nm.

I have tried this on various samples, e.g. sample chuck,  n-type Si wafer, Pt coating, isolators. All the results show the same, that the mean value of potential (or data center of potential scope) depends on the lift distance.

I don´t understand why Mean value of Potential depend on the lift distance. If the sample chuck and cantilever is electrically connected, the ´contact potential difference´should be constant. Is there any setting problems with my machine? Could you please leave our idea here?

Information about my AFM: Dimension 3100,  Nanoscope 4 controller, tip: SCM-PIT ; ´AC+DC´set to ´tip´; ´Bias´set to ´Sample´.

 

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Top 25 Contributor
58 Posts
Points 652

It seems that the Pt/Ir coating of the tip is worn already. So the Si material appears. The semiconductor´ bands bend when it measures. Therefore, a dependence between potential and lift distance occurred.

This dependence disappeared when I changed a new tip.

What is your idea about it?

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