University of Washington Nano-Metrology workshop - Tuesday Sept 20

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Mayur Savla Posted: Fri, Sep 16 2011 7:02 PM

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Flyer_Nano_Surface_Metrology_Workshop_in_Washington.pdf

Tuesday September 20

University of Washington’s NanoTech User Facility

Center for Nanotechnology, Fluke Hall, Room 215

10:10 AM Self-Optimizing High Resolution Atomic Force Microscopy

Mayur Savla, Applications Engineer  Bruker Instruments

AFM has been used for many years for ultra high-resolution microscopy and has earned a reputation as a powerful but complex tool. Recent advances by Bruker are making AFM easier to use, providing more unambiguous and quantitative information, and extending the ability of AFM to work with the most challenging samples. These advances include ScanAsyst mode with automatic image optimization technology enables easier, faster, and more consistent results in materials, life sciences, and polymer research, regardless of user skill level. A related imaging mode, PeakForce QNM, now provides quantitative adhesion and modulus measurements on a wide range of sample types.

10:40 AM AM  Stylus Profiler Applications Using DektakXT 

   Tim Ballinger – Bruker Nano

The DektakXT™ stylus profiler features a revolutionary design that enables unmatched repeatability of under five angstroms (<5Å) for thin film measurements. Widely used in microelectronics, semiconductor, display, solar, high-brightness LED, medical, scientific and materials science markets, Dektak stylus profilers are an essential precision metrology tool found in literally hundreds of production, research and failure analysis facilities around the world.  DektakXT systems are employed in both 2D profilometry and 3D surface profiling applications to measure nanoscale film thicknesses and step heights, 2D and 3D stress and other critical surface parameters that are vital in R&D, process development and Quality Assurance / Quality Control (QA/QC) applications. 

11:10 3D Optical Microscopy beyond the diffraction limit of light

- Mayur Savla, Applications Engineer  Bruker Instruments

White Light Interferometers (WLI) from Bruker (formerly - Wyko/Veeco) have been used for accurate 3D surface morphology measurements for about 2 decades. WLI gives nanometer vertical resolution but the lateral resolution has been limited to ~1um. AcuityXR™* is the latest innovation on the Bruker ContourGT™ platform that  improves the lateral resolution beyond the diffraction limit of light and enables the microscope to resolve features at or below 130nm. We will show examples of AcuityXR™ technology demonstrating high-resolution measurement of surfaces such as semiconductor wafers, glass, ceramics, MEMS devices, and polymer films. The ContourGT™ WLI features higher brightness dual-LED illumination, faster scanning and improved measurement accuracy. The new 64 bit Vision64 software offers upto 10x increase in measurement speed, improved ease of use and enhanced measurement and analysis functions.

11:45  AM – 4 PM

 Equipment demonstration

If you are planning to bring a sample  please contact  Mayur Savla ((Mayur.Savla@Bruker-Nano.com)  to discuss and schedule a  time