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Hi,
could you please explain, which algorithms are behind Z based and sidewall based trench depth analysis?
Does Z based means histogramm based? We do have challenging images with etch residuals left within the trench, where we do see a dependency between trench depth reported and algorithm used.
Thank you in advance.
Regards, Robert
Hi Robert -
Trench depth is an analytical, not statistical, Nanoscope analysis that measures the depth of trenches from the top surface of a trench to either the bottom of the trench or a change in sidewall angle. This analysis was designed around measuring RC2 DRAM trenches to the top of the trench to the top of the void at which the slope of the sidewall changes from near vertical to near 45 degrees or less. Changing the analysis from Z based to sidewall based will by design output different results.
For the application that you describe above, I would suggest a statistical analysis such as Depth, LDA or Layers. The scumming on the bottom of your trenches will likely smear out the lower of the histogram peaks but you will be able to adjust the peak selection criteria identify the bottom peak as you need.
Cheers,
Sean
Thank you Sean for your quick reply. That information helps a lot.
Btw, we do not have Layers analysis available.
Best Robert