The Nanoscale World

UC Berkeley AFM Workshop, Wednesday March 16, 2011

rated by 0 users
This post has 0 Replies | 1 Follower

Top 10 Contributor
Posts 288
Points 3,905
Bruker Employee
Stephen Minne Posted: Wed, Mar 2 2011 6:48 PM

UC Berkeley - Bruker
Advanced AFM Workshop
(Formerly Veeco)


AFM has been used for many years for ultra high-resolution microscopy and has earned a
reputation as a powerful but complex tool. Recent advances by Bruker are making AFM
easier to use, providing more unambiguous and quantitative information, and extending
the ability of AFM to work with the most challenging samples. These advances include
ScanAsyst mode with automatic image optimization technology enables easier, faster,
and more consistent results in materials, life sciences, and polymer research, regardless
of user skill level. A related imaging mode, PeakForce QNM, now provides quantitative
adhesion and modulus measurements on a wide range of sample types.

Wed March 16 - 10am - 11am:
Technical presentation
348 Hearst Mining Bldg

Wed March 16 - Thu Mar 17 - 9:00am - 4pm:
Multimode-8 demo & imaging customer samples
140 Hearst Mining Bldg

Registration and more information:
Mayur Savla
Sr. Applications Engineer, Bruker Corp.
Mayur.Savla (at) bruker-nano.com
408.596.4236

  • Filed under:
  • | Post Points: 10
Page 1 of 1 (1 items) | RSS
Copyright (c) 2011 Bruker Instruments