The AFM Webinar Series:

An Introduction to CD Metrology in the Semiconductor Industry

OVERVIEW

As evidenced at SPIE Advanced Lithography 2010, reference metrology has been identified as a key enabler for driving Moore’s law at the 45nm node and beyond. CD-AFM is rapidly being established as the requisite Reference Metrology System (RMS) for inline process control. In this webinar, we will introduce the InSight™ 3D Atomic Force Microscope as the world leader for reference metrology.

TOPICS

• InSight 3DAFM Platform Overview

— Physical Architecture

— Automation

— Recipe Design

- Offline Recipe Generation

- Offline Recipe Management

• Basics and concepts of CD-AFM

• Key Applications

— Depth Metrology

— CD Metrology

— LER/LWR/SWR

• Probes

— Depth Probes

— CD-Probes

— Application Specific Probes

• Reference Metrology

— Key Concepts of reference metrology

— Why reference metrology is needed

— Total Measurement Uncertainty (TMU)

— Fleet Matching and Fleet Matching Protocols (FMP)

PRESENTER

Sean M Hand, Product Manager, Veeco Instruments, Inc.

ORIGINAL LIVE BROADCAST

Wednesday, April 21, 2010