The Nanoscale World

3D Atomic Force Microscopy as an Alternative to X-SEM and TEM for Advanced Process Metrology


posted by SeanHand
Tue, May 25 2010

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3D Atomic Force Microscopy as an Alternative to X-SEM and TEM for Advanced Process Metrology
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Atomic force microscopy (AFM), on the other hand, represents an excellent solution for advanced process metrology. The Digital Instruments Dimension™ X3D Automated Atomic Force Microscope from Veeco (see Figure 1), is able to deliver TEM-like performance at a fraction of the cost. The X3D reduces cost per wafer pass by a factor as high as 10 and provides a return on investment after only 500 to 1000 cross-sections performed (i.e., by X-SEM or TEM). Furthermore, this nondestructive instrument is designed for in-fab use for process control.  Numerical results and data are available within minutes.

 

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