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The Bruker Inspire system enables new measurements of nanoscale chemistry and properties. Inspire extends Bruker’s proprietary PeakForce Tapping technology to nanoscale imaging of infrared absorption and reflection. This webinar focuses on the latest technology advances and expanding applications range addressed by this system, from nanoscale
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Kelvin probe force microscopy (KPFM, also known as surface potential microscopy) measures the work function, or electric potential, of materials or charges on the nanometer length scale. Despite much effort, KPFM has suffered from its inability to obtain consistent measurements of absolute work-functions in ambient conditions. Contamination, oxidation
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AFM Webinar Series: Atomic Force Microscopy: Characterizing Biomaterials at the Nanoscale OVERVIEW All events that occur in determining the biocompatibility of a biomaterial are based on molecular-scale interactions. Understanding how the properties of a biomaterial can influence these interactions has important implications, such as ensuring the successful
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A Special, Cross-Platform, 3D Optical Surface Profilometry and Atomic Force Microscopy Webinar: 3D Optical Surface Profilometry and Atomic Force Microscopy for Ophthalmic Manufacturing OVERVIEW In the contact lens and intra-ocular lens (IOL) markets, the increasing demand from an aging population, the rapid material innovation and development, and a
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The Atomic Force Microscopy Webinar Series: High-Resolution Imaging and Quantitative Nanomechanical Mapping Using Peak Force Tapping AFM OVERVIEW This webinar will present the principle and applications of Veeco’s revolutionary Peak Force Tapping™ technology, which operates at the sub-resonance frequency of cantilevers and uses the peak
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The Atomic Force Microscopy Webinar Series: Recent progress in AFM/IOM Combination - Highlights on Cancer Research and Neurology OVERVIEW: The ability to combine AFM and optical techniques has become an increasingly critical requirement for advanced biology research, especially in cell imaging. Join us for a free and informative webinar review of the
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The AFM Webinar Series: An Introduction to CD Metrology in the Semiconductor Industry OVERVIEW As evidenced at SPIE Advanced Lithography 2010, reference metrology has been identified as a key enabler for driving Moore’s law at the 45nm node and beyond. CD-AFM is rapidly being established as the requisite Reference Metrology System (RMS) for inline