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The Atomic Force Microscopy Webinar Series: Recent progress in AFM/IOM Combination - Highlights on Cancer Research and Neurology OVERVIEW: The ability to combine AFM and optical techniques has become an increasingly critical requirement for advanced biology research, especially in cell imaging. Join us for a free and informative webinar review of the
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DON'T MISS THIS WEBINAR: Pharmaceutical Applications of the Atomic Force Microscope OVERVIEW For over a decade, atomic force microscopy has been explored as a research tool in the Pharmaceutical Industry. The performed applications are diverse and cover the broad experimental capabilities of AFM. Once a biologically active molecule is selected for
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The Atomic Force Microscopy Webinar Series: Pharmaceutical Applications of the Atomic Force Microscope OVERVIEW For over a decade, atomic force microscopy has been explored as a research tool in the Pharmaceutical Industry. The performed applications are diverse and cover the broad experimental capabilities of AFM. Once a biologically active molecule
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The Atomic Force Microscopy Webinar Series: Pharmaceutical Applications of the Atomic Force Microscope OVERVIEW For over a decade, atomic force microscopy has been explored as a research tool in the Pharmaceutical Industry. The performed applications are diverse and cover the broad experimental capabilities of AFM. Once a biologically active molecule
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The Atomic Force Microscopy Webinar Series - Recording: A First In-Depth Look at the New Dimension® Edge™ AFM System and its Applications Overview Learn all about the new Dimension Edge Atomic Force Microscope (AFM) Closed-Loop system and its applications. The Dimension Edge leverages many Veeco innovations to provide solid performance in
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The AFM Webinar Series - PDF Slides: An Introduction to CD Metrology in the Semiconductor Industry OVERVIEW As evidenced at SPIE Advanced Lithography 2010, reference metrology has been identified as a key enabler for driving Moore’s law at the 45nm node and beyond. CD-AFM is rapidly being established as the requisite Reference Metrology System
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The AFM Webinar Series: An Introduction to CD Metrology in the Semiconductor Industry OVERVIEW As evidenced at SPIE Advanced Lithography 2010, reference metrology has been identified as a key enabler for driving Moore’s law at the 45nm node and beyond. CD-AFM is rapidly being established as the requisite Reference Metrology System (RMS) for inline
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I think Thomas wrote a nice long answer. The short answer is that: i) it is indeed a great idea and the subject of ongoing research for the last 10 or so years and ii) vastly more flexible than combining STM with Raman due to the known issues of requiring a conductive sample. The simple reason for using STM is in my opinion due to the fact that STM
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At what frequency did you attempt to excite the c-levers?
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