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If you don't mind a fully manual procedure, then you could just use the XY offset parameters to move the tip in a square pattern while the scan size is set at 0. The offsets move in feedback. So if you engage in contact mode with zero scan size, adjust the setpoint to a high enough force that you...
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Hi Sandeep, Is it possible that you send me the source code and the .dll, so we can try out. Thanks Chunzeng
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Hi Sandeep, I recall there was a problem doing ramping (for instance I-V curves) in Point&Shoot mode or Array mode in v720, which was fixed in v730. Can you elaborate what kind of problems you have with v730 on lithography? It is easier for us to fix a problem in the latest version; than go back...
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I posted the relevant section here: p48-56 ONLY - NANOMAN VS NANOLITHOGRAPHY V7-D (013-413-000).pdf Email me if you need the entire manual. Steve
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There is a good write up in the Nanolithography manual: 013-413-000 NANOMAN VS NANOLITHOGRAPHY page 48. From that section: Using a metal coated tapping tip, such as an SCM-PIT or MESP, engage on a clean, doped Si surface. Set the scan and feedback parameters to achieve a high quality image. Also see...
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Hi Scott, Please rename STMzMove.txt to STMzMove.dll, and upload in Nanoscope. chunzeng.li@bruker-nano.com Chunzeng
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This manual details NanoLithography procedures and sample programs to test your system. It also details the NanoScript™ macro language associated with NanoLithraphy. Version 5.12
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This support note details NanoLithography theory, NanoScript™ syntax for performing lithography commands and procedures to test, build and run NanoLithography programs. Refer to the following sections for using your NanoLithography Package: New NanoLithography Package: Section 316.2 on Page 2 Package...
Posted to
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by
Stephen Minne
on Tue, Jul 6 2010
Filed under: Nanolithography, Support Note