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  • Continuing the Nanoelectrical Revolution

    Innovation with Integrity Continuing the Nanoelectrical Revolution April 2013 Bruker has a history of innovation and leadership in the area of semiconductor electrical characterization with industry-leading SSRM, SCM, CAFM, and TUNA application modules for Dimension® and MultiMode® and AFM platforms...
    Posted to Nanovations by Tracy Krainer on Thu, Apr 4 2013
  • Innova

    Latest brochure about our Innova research AFM platform. Updated to reflect latest v8 user interface, high resolution origami DNA images, and extensive accessories list including AFM-Raman option.
    Posted to Brochures & Data Sheets by Thomas Mueller on Tue, Nov 22 2011
    Filed under: Innova, TappingMode, Raman, IRIS, semiconductor, electrochemistry, Raman spectroscopy, TERS
  • Turnkey 1ppm Environmental Control AFM Systems

    2-page datasheet showcasing Bruker's new turnkey AFM system configurations for environmental control. Guaranteeing 1ppm oxygen and water levels while at the same time guaranteeing highest AFM performance. Enabling research on sensitive samples such as OPVs and Lithium batteries. Ideal in combination...
    Posted to Brochures & Data Sheets by Thomas Mueller on Wed, Aug 24 2011
    Filed under: ScanAsyst, OPV, PFTUNA, energy, battery, semiconductor, SSRM, environmental control, electrochemistry
  • Webinar PDF Slides - An Introduction to CD Metrology in the Semiconductor Industry

    The AFM Webinar Series - PDF Slides: An Introduction to CD Metrology in the Semiconductor Industry OVERVIEW As evidenced at SPIE Advanced Lithography 2010, reference metrology has been identified as a key enabler for driving Moore’s law at the 45nm node and beyond. CD-AFM is rapidly being established...
    Posted to Webinars and Video on Tue, May 18 2010
    Filed under: Recipe Management, Reference Metrology, Recipe Generation, Semiconductor, InSight 3D AFM, CD Metrology, Recipe Design, Webinar Slides
  • Webinar Video - An Introduction to CD Metrology in the Semiconductor Industry

    The AFM Webinar Series: An Introduction to CD Metrology in the Semiconductor Industry OVERVIEW As evidenced at SPIE Advanced Lithography 2010, reference metrology has been identified as a key enabler for driving Moore’s law at the 45nm node and beyond. CD-AFM is rapidly being established as the...
    Posted to Webinars and Video on Tue, May 18 2010
    Filed under: Recipe Management, Reference Metrology, Recipe Generation, Semiconductor, InSight 3D AFM, Webinar, CD Metrology, Recipe Design
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