The Nanoscale World

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  • In Line Monitoring of Shallow Trench Isolation Divot Depth

    Atomic Force Microscopy (AFM) is a well-established metrology technique used in semiconductor at 65nm nodes and below. Measurement precision, and accuracy are foundational to the AFM including the added benefits of not being a direct, non-destructive technique that is not affected by feature material...
    Posted to Application Notes by BrukerApplications on Mon, Jan 4 2010
    Filed under: Dimension X3D, AFM, DeepTrench, Divot
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