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Hi John, I have found a system on my campus that uses a closed loop configuration. The software used is pretty old (Nanoscope v5). I have to write a script in order to run it for lithography. I could locate the litho.h file in the v4 folder but not the gui.h file (perhaps because the system was upgraded from v4 to v5). The system does not have a C+
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John, Thanks a lot for the reply and the comments. Unfortunately, I just found out from the people in the facility that the AFM is not closed loop and it needs a major hardware modification to do that. I had been assuming that it should be a closed loop system in XY, a mistake on my part. This is really sad news for me. Is there something that can be
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Here is another image of oxidation on silicon I did today. This will explain the situation better.
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Hi all, I am using the Dimension 3100 AFM, with a Nanoscope IVa controller for nanolithography (anodic oxidation) using Nanoman. I am having a problem controlling the tip using the 'Path' mode in nanoman. If I draw a short line on the scanned image (using the path function), and press 'Do it', the software shows that it is drawing. But
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I think I understood it. Thanks.
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Thanks Stefan. Yes, the software is v8.02 I think I might have figured out the cause of the problem. The software goes unresponsive if I do not group my objects in nanoplot. When I do the grouping, it works fine. Other than that I face problems when I use the z-depth feature and I can see the tip moving up and down in height, but making click-click
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Hello again Stefan, My sample is not conductive since I have a 300nm oxide layer on top of Si. I understand that I need a path for current to flow, so the sample must be grounded) but people have reported oxidation results on graphene keeping the sample floating also (and applying negative bias to the tip ~-20V or so). Can I apply an external bias to
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Thanks a lot Stefan. Another problem I face after using NanoPlot is that I do not get any height scan at all. Here is what I do: Take a scan before lithography. Open the scan in nanoplot and etch. Then go back to take another scan. When I do this step, the software doesn't give me a scan at all. I just get no topography, it is all blank. I have
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Hello, I am working on lithography using the Innova system by scratching a PMMA resist layer. The problem I face is that there is always a tilt in the original scan. The tilt in the plane is 32nm in the x-x' axis and ~200nm in the y-y' direction of the scan. Next, when I do the scratching using NanoPlot, I apply a constant z-depth value and
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Stefan, That sounds excellent. I can bias the sample with the opposite polarity then. This was good to know. I am only concerned about leakage currents/safety but I will see if that is a concern or not. Thanks a lot