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Hi Robert - Here are some ideas on where to look for opportunities to present: http://www.metromeet.org/en/ http://spie.org/microtechnologies-new-millennium.xml http://www.semiconeuropa.org/ProgramsandEvents/index.htm?parent=yes&parentId=144 -Sean
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Hi Robert - Just to folow up, the Sampling Guidelines document is in the Veeco Media/Software, Documents and Tools section. Best Regards, Sean
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Hi Robert - You make very good points and determining the balance point between high resolution CD imaging, throughput and tip wear is vital to minimizing the uncertainty of these measurements. In the media section there is a document titled: Normal 0 false false false MicrosoftInternetExplorer4 CDAFM Sampling Guidelines (rev_06182008) Authored by Vladimir
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Hi Robert - For SWR analysis, a plane is fitted to and then extracted from the sidewall. All of the data points are used, there is no interpolation. You can compensate for drift by using either a 2nd or 3rd order planefit. When using a higher order planefit though, you want to make sure that you are not planefitting out actual surface topography. A
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Hi Robert - In both V6 and V7, the measurement location for LER is relative to the top of the feature. For example, if you have the location set to 10% and the line feature is 100nm tall, the measurement location will be 10nm down from the top of the line. Cheers, Sean
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Hi Robert - The files that contains the settings for the analysis are those titled *.prg This may or may not have the information for which you are looking. The other option might be to try to open only the autoprogram through realtime via Hardware Simulation File/Open/Autoprogram. Lastly you can move the TQ files locally to your computer. The mesage
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Normal 0 false false false MicrosoftInternetExplorer4 Atomic force microscopy (AFM), on the other hand, represents an excellent solution for advanced process metrology. The Digital Instruments Dimension™ X3D Automated Atomic Force Microscope from Veeco (see Figure 1), is able to deliver TEM-like performance at a fraction of the cost. The X3D reduces
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Hello Gerard and Peter - I have used a Veeco Probes (https://www.veecoprobes.com/) FESP substrate and lever onto which was glued a pyramidal diamond probe from Micro Star (http://www.microstartech.com/) for imaging surface roughness between very tall (80 um) posts (the diamond pyramids were ~100um tall) and they worked quite well. Following up on Peter's
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Good Evening Don - I am not famililar with a sample with < 1nm feature sizes with which to accurately measure the tip width. How far up the probe do you want to characterize it's shape? You could probably get an inferred measurement from a calibrated linewith with low line edge roughness and linewidth variation by comparing the calibrated linewidth
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Chrome-on-glass photomask - looking for re-entrant profiles and overhang of the chrome cap.